Facilities
Metrology Equipment
- Hitachi S-4500 Field Emission Scanning Electron Microscope (FESEM) #1
- Manufacturer:
Hitachi High Technologies America, Inc. - Operating Instructions
Description
This Hitachi S-4500 field emission scanning electron microscope (FESEM) is capable of producing high-resolution images between 20 and 500k. The system is capable of accelerating voltages between 0.5-30 kV. With precision setup of the aperture and beam it is capable of capturing images with resolution of ~5 nm. The system can accommodate samples up to 2" in diameter on its manual three-dimension sample stage with tilt capability from 0° to 45°. Active image capture and analysis software provided by the Revolution 1.6 software allows analytical data and storage. The system is also equipped with an X-ray Energy Dispersive Spectroscopy (EDX) system from 4pi that allows users to analyze elemental compositions.
Allowed Materials
Samples to be imaged must be dry, and stable in vacuum and under electron irradiation. The maximum sample size is approx. 2 inches in diameter. If the sample is non-conducting, it might be necessary to coat the sample with a thin conductive layer before imaging. Please contact Mike Young (mike.young@nd.edu) if you have questions regarding the suitability of a particular sample.
Prohibited Materials
Substances which can outgas/sublime/evaporate in vacuum; hydrocarbons
(oil, grease,
fingerprints); living or recently-deceased beings or tissues of same;
liquids of any kind.
Cleaning procedure
Samples generally do not require special cleaning, unless needed
to remove Prohibited Materials
before mounting. Only approved materials (available in the lab) will
be used for mounting samples;
copper hold-down clips, carbon-impregnated sticky dots, and colloidal
graphite are available. All
materials to enter the SEM will be handled with latex, poly, or nitrile
clean gloves – NO
FINGERPRINTS.
Contact Information:
For additional information, please contact the NDNF Staff at pfay@nd.edu.
06.29.15
