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Facilities

Deposition Equipment

Description

The Lesker ALD150LX atomic layer deposition (ALD) system is designed for R&D applications using their patented precursor focusing technology and advanced process capabilities. The tools cluster technology eliminates unwanted atmosphere exposure between critical steps and analysis to protect sensitive layers and interfaces. Independent substrate heating, in-situ ellipsometry, four separate inlet ports, and temperature operation up to 500C. The system can process up to 150mm diameter substrates.

Precursors: TDMAH, TDMAZ, TiCl₄, TMA, and water

Contact Information:

For additional information, please contact the NDNF staff at pfay@nd.edu.

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