Facilities
Deposition Equipment
- Model FC-1800 #1
Electron Beam Vacuum Deposition/Thin Film Coater System - Manufacturer:
AIRCO Temescal - Operating Instructions
Description
The Model FC-1800 is an electron beam vacuum deposition/thin-film coater system. This unit has a six-pocket crucible system for deposition of multiple films without the need to open the chamber.
Also installed in this evaporator is an EH200 (Kaufman & Robinson) ion source. The ion source is used during thin-film deposition and surface etching. The advantages of ion beam processing of materials offers benefits such as the densification of thin films, dry plasma etch of patterned wafers, deposition of smooth multilayer film stacks, and the modification/activation of surfaces. Click here for manual.
Film types available on FC-1800 #1 are: Al, AlB, AlBSi, AlSi, Au, AuGe, Co, Cr, Ge, Mo, MoO, Ni, Pd, Pt, PtIr, Si, Si (P-Doped), SiO2, Ta, Ti, TiO2, V, and W.
Contact Information:
For additional information, please contact the NDNF staff at pfay@nd.edu.
