Facilities
Deposition Equipment
- First Nano EasyTube® 6000 Furnace System
- Manufacturer:
First Nano - Operating Instructions
Description
The First Nano EasyTubeŽ 6000 is a horizontal-tube furnace system, capable of processing 4" (100 mm) diameter silicon wafers. Three tubes are configured for low-pressure chemical-vapor deposition (LPCVD) of silicon dioxide, polysilicon, and silicon nitride. A cantilevered loading system with a horizontal HEPA laminar flow filter facilitates wafer loading and unloading with minimal particle generation. Each process tube is enclosed in a three-temperature-zone, resistance-heated furnace. A comprehensive process control computer permits use of custom deposition recipes and full automatic control of the entire deposition cycle.
| Source Gases | Films | |
| FirstNano2 | SiH2CL2, NH3, N2 | silicon nitride |
| FirstNano3 | SiH4, PH3, N2 | doped polysilicon |
| FirstNano4 | Tetraethyl orthosilicate (TEOS), O2, N2 | silicon dioxide |
Contact Information:
For additional information, please contact the NDNF staff at pfay@nd.edu.
2.10.15
