Deposition Equipment

first nano easy tube 6000


The First Nano EasyTubeŽ 6000 is a horizontal-tube furnace system, capable of processing 4" (100 mm) diameter silicon wafers. Three tubes are configured for low-pressure chemical-vapor deposition (LPCVD) of silicon dioxide, polysilicon, and silicon nitride. A cantilevered loading system with a horizontal HEPA laminar flow filter facilitates wafer loading and unloading with minimal particle generation. Each process tube is enclosed in a three-temperature-zone, resistance-heated furnace. A comprehensive process control computer permits use of custom deposition recipes and full automatic control of the entire deposition cycle.

  Source Gases Films
FirstNano2 SiH2CL2, NH3, N2 silicon nitride
FirstNano3 SiH4, PH3, N2 doped polysilicon
FirstNano4 Tetraethyl orthosilicate (TEOS), O2, N2 silicon dioxide

Contact Information:

For additional information, please contact the NDNF staff at pfay@nd.edu.


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