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Facilities

Deposition Equipment

Description

The General Air Model 250 is a CVD reactor used to deposit silicon dioxide or silicon nitride on a small substrate. The substrate can be heated to 750 C (max) using a graphite strip heater and temperature controller. A vacuum pump and pressure controller are employed to maintain a vacuum within the 6" diameter bell jar. Mass-flow controllers are used for all of the feed gases.

Feed gases available: SiH₄, NH₃, O₂, and N₂

Contact Information:

For additional information, please contact the NDNF staff at pfay@nd.edu.

2.10.15

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