Other Equipment


The PSC-101 is a five-step spin dryer that is to be used in conjunction with the MOS clean hood. While it is housed outside of the MOS clean hood, it is considered to be part of it. Protocol compliant with the MOS clean must be observed.

The five-step dry process consists of a spin, quality spin with resistivity monitoring, purge and two dry steps. Time and spin speeds being changed for all the steps except the quality spin, which monitors resistivity. The hood can process 4" wafers only.

Allowed Materials

Si wafers only.

Prohibited Materials

Anything other than Si wafers.

Cleaning procedure

Contact Information:

For additional information, please contact the NDNF Staff at pfay@nd.edu.


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