Facilities

Lithography Equipment

Description

The OAI light source is a high-performance collimated illumination system intended for UV flood exposure related applications. The system has an external timer that controls a shutter inside the light source in 0.1 second increments up to 999.9 seconds.

Allowed Materials

Semiconductor materials, dielectric and metal thin films, resists.

Prohibited Materials

Organics, liquids and greases of any kind.

Cleaning procedure

Mike to provide general cleaning procedure.

Contact Information:

For additional information, please contact the NDNF Staff at pfay@nd.edu.

 


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