Facilities

Deposition Equipment

Description

The Oerlikon 450B evaporator is an electron beam vacuum deposition/thin-film coater system. This unit has an eight-pocket crucible system for deposition of multiple films without the need to open the chamber. It is also equipped with two thermal (RPS 5002) sources that use high-current (400A) heating through tungsten filaments to evaporate alloys and custom metals. The system is equipped with a Kaufman & Robinson (KRI) ion source. The ion source may be used during the deposition of thin films to enhance the film's properties (density, refractive index) and generally improve the overall quality of the film.

Film types available: Ti, Au, Al, Pt, Cr, Ni, Pd, NiCr, and AuGe

Gases: Ar and O2

Contact Information:

For additional information, please contact the NDNF staff at pfay@nd.edu.

1.04.16

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