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Facilities

Deposition Equipment

Description

The Savannah 100 is an atomic layer deposition (ALD) tool. ALD is a technique that allows growth of thin films, atomic layer by layer. The ALD can create conformal coatings of metals, oxides, and nitrides of all substrates. This tool can handle small pieces up to 4" wafers.

Film types available: Al₂O₃ & HfO₂

Gases: H₂O and O₃

Contact Information:

For additional information, please contact the NDNF staff at pfay@nd.edu.

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