College News
AAAS Honors Two Notre Dame Engineers <more>
Bernstein Named IEEE Fellow <more>
Bowyer Receives Award
of Excellence <more>
Chicago Full-scale Monitoring Project Confirms Building Design <more>
Collaborative Team to Develop Wireless Response System <more>
Electrical Engineers Receive NIRT Grants <more>
Engineering Advisory Council Member to Receive Lifetime Achievement Award <more>
Kijewski-Correa Receives Marshall Award <more>
Kogge Presents at CRA Conference <more>
Laneman and Poellabauer Receive NSF CAREER Awards <more>
New Instrument Produces Nanostructures without Lithography <more>
Paolucci Named ASME Fellow <more>
Sain Receives Meritorious Service Award <more>
Several Faculty Honored
for Highly-cited Papers  
<more>
Westerink Briefs Congressional Committee on Storm Surge <more>



 

Student News

CSE Students Finish Ninth in ACM
Contest <more>

Dai Receives Honorable Mention at Bioengineering Conference <more>

Electrical Engineering Students Establish Amateur Radio Club
<more>
Engineering Industry Day Features 70 Companies <more>
Introduction to Engineering Program Hosts High School Students <more>
SWE Awards Scholarships to Notre Dame Engineers
<more>
 

Alumni News

Carlos A. Paz deAraujo (B.S., EE ’99; M.S., EE ’79; and Ph.D., EE ’82); Larry Augustin (B.S., EE ’84); Gerald M. Belian (B.S., CE ’62); James G. Berges (B.S., EE ); John F. Daegele (B.S., EE ’83); Allen Hemberger (B.S., CSE ’01); Casey Korecki (B.S., ME ’03); David Kowalski (B.S., ME ’80); Mary Ledet (B.S., EE ’04); Jerome L. Margraf (B.S., ME ’67); Richard O. Martin (M.S., EE ’ 64); Don McBride (B.S., EE ’66);  Edward J. Nowacki (M.S., EE ’67); Haresh P. Patel (B.S., EE ’83); Gang Quan (Ph.D., CSE ’02); Niel Ransom (Ph.D., EE ’73); James Schmiedeler (B.S., ME ’96); Robert Stackowiak (B.S., CE ’78); William Stanchina (B.S., EE ’71); Jim Tyler (B.S., ME ’86); and Jinhui Xu (Ph.D., CSE ’00).
To visit College of Engineering Alumni
News <click here>

New Instrument Produces Nanostructures without Lithography

A team of researchers led by Alan C. Seabaugh, professor of electrical engineering and associate director of the Center for Nano Science and Technology,  has developed a new instrument capable of positioning vacuum-deposited metals, semiconductors, and dielectrics with nanometer-scale resolution without organic resists and customized masks (traditional lithography). Instead a precision nanopositioner is used to translate a substrate under a stencil mask between evaporation of dissilimar materials. This piezoflexure-enabled nanofabrication (PEN) techniquecan produced features at the nanometer scale. The PEN system allows for the clean characterization on surfaces near room temperature.

 

   

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